To develop high-performance and durable anti-fogging coatings, a superhydrophilic surface layer was fabricated via a one-step plasma-enhanced chemical vapor deposition (PECVD) process using vinyltrimethoxysilane (VTMS) as a precursor. The effects of deposition voltage and pressure (low pressure and atmospheric pressure) on the anti-fogging performance were systematically investigated. The chemical composition and surface morphology of the resulting coatings were characterized by XPS, FTIR, SEM, and AFM. The results demonstrate that the coating is primarily composed of silicon-oxygen constituents with a abundance of hydrophilic Si-OH groups, which is critical for achieving superhydrophilicity, as evidenced by a water contact angle (WCA) below 10°. The coated substrates exhibited excellent anti-fogging properties, maintaining effectiveness for up to 45 days. This study provides a efficient one-step strategy for material surface modification, significantly enhancing the hydrophilicity and durability of substrates, thereby offering both theoretical insight and practical support for the application of high-performance anti- fogging coatings.

Dielectric barrier discharge; Plasma; Chemical vapor deposition; Anti-fogging