This research centered on the design, fabrication, and testing of HfO₂/SiO₂ anti-reflection films. The films were designed based on the Fresnel formula and multilayered interference theory, with optimization conducted using TFCalc software. By optimizing the substrate temperature in the plasma-assisted electron beam evaporation deposition process, the number of film layers and the thickness of each layer were consistent with theoretical values, with an error margin of approximately ±0.01 µm, thus meeting the design requirements. The surface of all multilayer films exhibited excellent smoothness (Ra<1 nm), with well-organized layer structures and clean interfaces free from cracks or defects. Spectrophotometric analysis revealed that the transmittance of the HfO₂/SiO₂ anti-reflective films at 1064 nm all approached 98 %, demonstrating strong light-transmitting performance. Meanwhile, the laser-induced damage threshold (LIDT) of the HfO₂/SiO₂ anti-reflection films was enhanced by 30.2 %, increasing from the initial value of 11.6 J/cm² to 15.1 J/cm². This improvement in the laser-induced damage threshold was confirmed to stem from significant changes in the film's crystallinity and roughness, which were caused by adjustments to the substrate temperature that altered the crystal structure and density of the films.

laser-induced damage threshold,multilayer composite oxide optical thin films,plasma-assisted electron beam evaporation